Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. This book focuses on the fundamental physics underlying the techniques used to analyze the nature of surfaces and near-surfaces in the properties of materials. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Coverage includes new analytical techniques, such as x-ray fluorescence (XRF) in thin film analysis. This volume updates (with a nano focus) the well regarded 1986 book, Surface and Thin Film Analysis, by Feldman and Mayer.
Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.
From materials science to integrated circuit development, much of modern technology is moving from the microscale toward the nanoscale. This book focuses on the fundamental physics underlying innovative techniques for analyzing surfaces and near-surfaces. New analytical techniques have emerged to meet these technological requirements, all based on a few processes that govern the interactions of particles and radiation with matter. This book addresses the fundamentals and application of these processes, from thin films to field effect transistors.
Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.
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Gebunden. Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Comprehensively treats the major characterization techniques used to analyze thin films from the micro- to nanoscaleIncorporates the use of x-ray fluorescence (XRF) in thin film analysisFocuses on surface analysis and includes analytical te. N° de réf. du vendeur 5909790
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