Type d'article
Etat
Reliure
Particularités
Pays
Evaluation du vendeur
Edité par The International Society for Optical Engineering, Bellingham, 1989
ISBN 10 : 0819401234ISBN 13 : 9780819401236
Vendeur : SUNSET BOOKS, Newark, OH, Etats-Unis
Livre
Soft cover. Etat : Good. No Jacket. First. 572pp. W/full markings and pocket. Wear, Soil. Weight is 4 lb. Will not fit in Flat Rate Priority Mail envelope. USPS Variable Rate applies for Domestic or International. Ex-Library Size: 4to. Book.
Edité par SPIE Press, 2010
ISBN 10 : 0819475602ISBN 13 : 9780819475602
Vendeur : Recycle Bookstore, San Jose, CA, Etats-Unis
Livre
Hardcover. Etat : Near Fine. Book has some light rubbing to covers, otherwise book is in excellent condition, clean and bright pages with sturdy covers and great binding, very close to new.
Edité par SPIE Press, 2021
ISBN 10 : 1510639950ISBN 13 : 9781510639959
Vendeur : PBShop.store US, Wood Dale, IL, Etats-Unis
Livre
HRD. Etat : New. New Book. Shipped from UK. Established seller since 2000.
Edité par SPIE Press, 2021
ISBN 10 : 1510639950ISBN 13 : 9781510639959
Vendeur : PBShop.store UK, Fairford, GLOS, Royaume-Uni
Livre
HRD. Etat : New. New Book. Shipped from UK. Established seller since 2000.
Edité par SPIE Press, Bellingham, 2021
ISBN 10 : 1510639950ISBN 13 : 9781510639959
Vendeur : Grand Eagle Retail, Wilmington, DE, Etats-Unis
Livre
Hardcover. Etat : new. Hardcover. This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies. Written for new and experienced engineers, technology managers, and senior technicians, readers of this book will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.
Edité par SPIE Press, 2010
ISBN 10 : 0819475602ISBN 13 : 9780819475602
Vendeur : dsmbooks, Liverpool, Royaume-Uni
Livre
Hardcover. Etat : Very Good. Very Good. book.