Edité par Woodhead Publishing Ltd 2015-08-03, 2015
ISBN 10 : 0081002505 ISBN 13 : 9780081002506
Langue: anglais
Vendeur : Chiron Media, Wallingford, Royaume-Uni
EUR 171,71
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Ajouter au panierHardcover. Etat : New.
Vendeur : Majestic Books, Hounslow, Royaume-Uni
EUR 192,03
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Ajouter au panierEtat : New. pp. 646.
Vendeur : Revaluation Books, Exeter, Royaume-Uni
EUR 195,73
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Ajouter au panierHardcover. Etat : Brand New. 1st edition. 328 pages. 9.00x6.25x0.75 inches. In Stock.
Vendeur : Books Puddle, New York, NY, Etats-Unis
EUR 205,65
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Ajouter au panierEtat : New. pp. 646.
Vendeur : Ria Christie Collections, Uxbridge, Royaume-Uni
EUR 209,54
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Ajouter au panierEtat : New. In.
Vendeur : Biblios, Frankfurt am main, HESSE, Allemagne
EUR 211,49
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Ajouter au panierEtat : New. pp. 646.
Edité par Elsevier Science Aug 2015, 2015
ISBN 10 : 0081002505 ISBN 13 : 9780081002506
Langue: anglais
Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
EUR 165
Autre deviseQuantité disponible : 2 disponible(s)
Ajouter au panierBuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. 328 pp. Englisch.
Vendeur : Brook Bookstore On Demand, Napoli, NA, Italie
EUR 147,09
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Ajouter au panierEtat : new. Questo è un articolo print on demand.
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
EUR 179,85
Autre deviseQuantité disponible : 2 disponible(s)
Ajouter au panierBuch. Etat : Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.