Advances in Imaging and Electron Physics - Couverture rigide

Couverture rigide

ISBN 10 : 0443296480 ISBN 13 : 9780443296482

Editeur : Academic Press Inc, 2024

Synopsis

Advances in Imaging and Electron Physics, Volume 229 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.

A propos du livre

À propos des auteurs

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.

Dr Martin Hÿtch, serial editor for the book series "Advances in Imaging and Electron Physics (AIEP)", is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on "Quantitative high-resolution transmission electron microscopy (HRTEM)", joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Détails de l'édition

• Éditeur: Academic Press Inc
• Date d'édition: 2024
• ISBN 10: 0443296480
• ISBN 13: 9780443296482
• Reliure: Relié
• Langue: anglais
• Nombre de pages: 888
• Coordonnées du fabricant: non disponible