Advances in Imaging and Electron Physics - Couverture rigide

Couverture rigide

ISBN 10 : 0443471088 ISBN 13 : 9780443471087

Editeur : Academic Press, 2026

Synopsis

Advances in Imaging and Electron Physics, Volume 237 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release include Stochastic geometry with applications in materials science, Morphological models of random media, Grain models and application to microstructure simulation, MCMC algorithms for model parameterization, Tessellations models, Tesselation models, Fast simulation of tessellation models using Eikonal equation, Applications to Image Processing, Synthesis of Training Images for Supervised Learning Problems, and Segmentation Methods Based on the Eikonal Equation.

A propos du livre

À propos de l'auteur

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Détails de l'édition

• Éditeur: Academic Press
• Date d'édition: 2026
• Langue: anglais
• ISBN 10: 0443471088
• ISBN 13: 9780443471087
• Reliure: Relié
• Nombre de pages: 134
• Éditeur: Hÿtch
• Coordonnées du fabricant: Academic Press; https://shop.elsevier.com/; ; 230 PARK AVENUE, SUITE 800; NY; NY; 10169; Etats-Unis
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