High-K Gate Dielectrics - Couverture rigide

Couverture rigide

ISBN 10 : 0750309067 ISBN 13 : 9780750309066

Editeur : Institute of Physics Publishing, 2003

Synopsis

The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be required, making this is a subject of intensive research activity within the microelectronics community.

High k Gate Dielectrics reviews the state-of-the-art in high permittivity gate dielectric research. Consisting of contributions from leading researchers from Europe and the USA, the book first describes the various deposition techniques used for construction of layers at these dimensions. It then considers characterization techniques of the physical, chemical, structural, and electronic properties of these materials. The book also reviews the theoretical work done in the field and concludes with technological applications.

A propos du livre

À propos de l'auteur

Michel Houssa Laboratoire Materiaux et Microelectronique de Provence, Universite de Provence, France Silicon Processing and Device Technology Division, IMEC, Belgium

Détails de l'édition

• Éditeur: Institute of Physics Publishing
• Date d'édition: 2003
• Langue: anglais
• ISBN 10: 0750309067
• ISBN 13: 9780750309066
• Reliure: Relié
• Nombre de pages: 350
• Éditeur: Houssa Michel
• Coordonnées du fabricant: non disponible
• Personne responsable: non disponible