Handbook of Thin Film Deposition: Principles, Methods, Equipment, and Applications - Couverture rigide

Couverture rigide

ISBN 10 : 0815514425 ISBN 13 : 9780815514428

Editeur : William Andrew Publishing, 2002

Synopsis

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition.

This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

A propos du livre

À propos de l'auteur

Krishna Seshan

Détails de l'édition

• Éditeur: William Andrew Publishing
• Date d'édition: 2002
• Langue: anglais
• ISBN 10: 0815514425
• ISBN 13: 9780815514428
• Reliure: Relié
• Numéro d'édition: 2
• Nombre de pages: 420
• Éditeur: Seshan Krishna
• Coordonnées du fabricant: non disponible
• Personne responsable: non disponible