Diazonaphthoquinone-Based Resists - Couverture souple

Dammel, Ralph

 
9780819410191: Diazonaphthoquinone-Based Resists
Couverture souple
ISBN 10 : 0819410195 ISBN 13 : 9780819410191
Editeur : SPIE Press, 1993

Synopsis

This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistries of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antireflection layers, and phase shift technology are treated.Contents - Preface to the Series - Table of Contents - Preface - Introduction - Basic Chemistry of DNQ/Novolak Resists - Basic Chemistry of Novolaks - DNQ/Novolak Interactions - Step-by-step View of the Lithographic Process - Advanced Processing Schemes for DNQ Resists - Outlook on DNQ/Novolak Systems

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.

Éditeur
SPIE Press
Date d'édition
1993
Langue
anglais
ISBN 10 
0819410195
ISBN 13 
9780819410191
Reliure
Broché
Nombre de pages
203
Coordonnées du fabricant
non disponible
Personne responsable
non disponible