Resolution Enhancement Techniques in Optical Lithography - Couverture souple

Wong, Alfred Kwok-Kit

Couverture souple

ISBN 10 : 0819439959 ISBN 13 : 9780819439956

Editeur : SPIE Press, 2001

Synopsis

The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.

Détails de l'édition

• Éditeur: SPIE Press
• Date d'édition: 2001
• Langue: anglais
• ISBN 10: 0819439959
• ISBN 13: 9780819439956
• Reliure: Broché
• Nombre de pages: 214
• Coordonnées du fabricant: non disponible
• Personne responsable: non disponible