Articles liés à Resolution Enhancement Techniques in Optical Lithography

Resolution Enhancement Techniques in Optical Lithography - Couverture souple

Wong, Alfred Kwok-Kit

 
9780819439956: Resolution Enhancement Techniques in Optical Lithography
Couverture souple
ISBN 10 : 0819439959 ISBN 13 : 9780819439956
Editeur : SPIE Press, 2001

Synopsis

The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.

Éditeur
SPIE Press
Date d'édition
2001
Langue
anglais
ISBN 10 
0819439959
ISBN 13 
9780819439956
Reliure
Broché
Nombre de pages
214
Coordonnées du fabricant
non disponible
Personne responsable
Mare Nostrum Group B.V.
gpsr@mare-nostrum.co.uk

Doelen 72
Breda
4831 GR
Pays-Bas