Optical Imaging In Projection Microlithography - Couverture souple

Wong, Alfred K.

 
9780819458292: Optical Imaging In Projection Microlithography

Synopsis

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.