Articles liés à Materials, Technology and Reliability for Advanced...

Materials, Technology and Reliability for Advanced Interconnects and LowK Dielectrics - Couverture souple

Oehrlein, G. S.

 
9781107413153: Materials, Technology and Reliability for Advanced Interconnects and LowK Dielectrics

Synopsis

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

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Présentation de l'éditeur

This book highlights important achievements and challenges in advanced interconnects and low-k dielectrics as employed in the microelectronics industry. The replacement of Al alloys with Cu along with the introduction of new barrier materials to protect Cu from chemical attack, and the utilization of new dielectric materials with a lower relative dielectric constant k than SiO2 in multilevel metallization structures of increasing complexity, are the major themes of evolution in this field. Invited reviews illustrate the significant progress that has been achieved as well as the challenges that remain. Contributed papers presented by researchers from different countries demonstrate progress on current topics using a truly multidisciplinary approach.

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