This book provides insight into the use of CAD for layout analysis and optimization of interconnect in high speed, high complexity integrated circuits, which have become the dominating factor in determining system performance in nanometer technologies. The text investigates the effects on system performance and reliability of wire size, spacing, wire length, coupling length, load capacitance, rise time of the inputs, place of overlap, frequency, shields, signal direction and wire width for both the aggressors and the victim wires. The authors present a range of CAD algorithms and techniques for synthesizing and optimizing interconnect.
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Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnect Provides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits
Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.
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Destinations, frais et délaisVendeur : moluna, Greven, Allemagne
Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnectProvides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuitsPresen. N° de réf. du vendeur 4174216
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Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnectProvides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits 160 pp. Englisch. N° de réf. du vendeur 9781441938442
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Taschenbuch. Etat : Neu. Druck auf Anfrage Neuware - Printed after ordering - Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits.The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered. N° de réf. du vendeur 9781441938442
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Taschenbuch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -Interconnect has become the dominating factor in determining system performance in nanometer technologies. Dedicated to this subject, Interconnect Noise Optimization in Nanometer Technologies provides insight and intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits.The authors bring together a wealth of information presenting a range of CAD algorithms and techniques for synthesizing and optimizing interconnect. Practical aspects of the algorithms and the models are explained with sufficient details. The book investigates the most effective parameters in layout optimization. Different post-layout optimization techniques with complexity analysis and benchmarks tests are provided. The impact crosstalk noise and coupling on the wire delay is analyzed. Parameters that affect signal integrity are also considered.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 160 pp. Englisch. N° de réf. du vendeur 9781441938442
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