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Synopsis
This book includes discussion of silicon materials and electrical engineering properties as used in the design of analog components. Due to the author's background at Texas Instruments, the book will have an emphasis on newer process integration techniques and technology to help professional engineers in the field understand and develop electrical components.
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Présentation de l'éditeur
Compiled from industrial and academic lecture notes and reflecting years of experience in the development of silicon devices, this book covers both their theoretical and practical aspects, and how their electrical properties and processing conditions interact.
Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.
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Silicon Devices and Process Integration: Deep Submicron and Nano-Scale Technologies
Vendeur : Lucky's Textbooks, Dallas, TX, Etats-Unis
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Silicon Devices and Process Integration
impression à la demandeVendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
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Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author's industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include:A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon;State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS;CMOS-only applications, such as subthreshold current and parasitic latch-up;Advanced Enabling processes and process integration.This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science. 624 pp. Englisch. N° de réf. du vendeur 9781441942241
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Silicon Devices and Process Integration
impression à la demandeVendeur : moluna, Greven, Allemagne
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Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Focuses on process integration techniques and technologyAddresses both raw silicon material and demonstrates their use in componentsSilicon Devices and Process Integration covers state-of-the-art silicon device. N° de réf. du vendeur 4174578
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Silicon Devices and Process Integration: Deep Submicron and Nano-Scale Technologies
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Silicon Devices and Process Integration
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Silicon Devices and Process Integration
impression à la demandeVendeur : Majestic Books, Hounslow, Royaume-Uni
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Etat : New. Print on Demand pp. 624 49:B&W 6.14 x 9.21 in or 234 x 156 mm (Royal 8vo) Perfect Bound on White w/Gloss Lam. N° de réf. du vendeur 5863191
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Silicon Devices and Process Integration
Edité par
Springer US, Springer US Okt 2010, 2010
ISBN 10 : 1441942246
ISBN 13 : 9781441942241
Neuf
Taschenbuch
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Taschenbuch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author¿s industrial and academic lecture notes and reflects years of experience in the development of silicon devices.Features include:A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon;State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS;CMOS-only applications, such as subthreshold current and parasitic latch-up;Advanced Enabling processes and process integration.This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 624 pp. Englisch. N° de réf. du vendeur 9781441942241
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Silicon Devices and Process Integration
impression à la demandeVendeur : Biblios, Frankfurt am main, HESSE, Allemagne
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Etat : New. PRINT ON DEMAND pp. 624. N° de réf. du vendeur 183066050
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Silicon Devices and Process Integration : Deep Submicron and Nano-Scale Technologies
Edité par
Springer US, Springer US, 2010
ISBN 10 : 1441942246
ISBN 13 : 9781441942241
Neuf
Taschenbuch
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. Druck auf Anfrage Neuware - Printed after ordering - Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author's industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include:A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon;State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS;CMOS-only applications, such as subthreshold current and parasitic latch-up;Advanced Enabling processes and process integration.This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science. N° de réf. du vendeur 9781441942241
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Silicon Devices and Process Integration: Deep Submicron and Nano-Scale Technologies
Edité par
Springer, 2010
ISBN 10 : 1441942246
ISBN 13 : 9781441942241
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Vendeur : Mispah books, Redhill, SURRE, Royaume-Uni
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Paperback. Etat : Like New. Like New. book. N° de réf. du vendeur ERICA77314419422466
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