This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
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Vendeur : Kennys Bookshop and Art Galleries Ltd., Galway, GY, Irlande
Etat : New. 2021. 2nd Edition. Hardcover. . . . . . N° de réf. du vendeur V9781510639959
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Vendeur : PBShop.store UK, Fairford, GLOS, Royaume-Uni
HRD. Etat : New. New Book. Shipped from UK. Established seller since 2000. N° de réf. du vendeur FW-9781510639959
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Vendeur : Rarewaves.com USA, London, LONDO, Royaume-Uni
Hardback. Etat : New. Second Edition. This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies. N° de réf. du vendeur LU-9781510639959
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Vendeur : Revaluation Books, Exeter, Royaume-Uni
Hardcover. Etat : Brand New. 580 pages. 10.20x7.32x1.50 inches. In Stock. N° de réf. du vendeur __1510639950
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Vendeur : Kennys Bookstore, Olney, MD, Etats-Unis
Etat : New. 2021. 2nd Edition. Hardcover. . . . . . Books ship from the US and Ireland. N° de réf. du vendeur V9781510639959
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Vendeur : Rarewaves.com UK, London, Royaume-Uni
Hardback. Etat : New. Second Edition. This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies. N° de réf. du vendeur LU-9781510639959
Quantité disponible : 1 disponible(s)
Vendeur : Mispah books, Redhill, SURRE, Royaume-Uni
hardcover. Etat : New. NEW. SHIPS FROM MULTIPLE LOCATIONS. book. N° de réf. du vendeur ERICA82915106399506
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