Articles liés à Extreme Ultraviolet Lithography

Extreme Ultraviolet Lithography - Couverture souple

Levinson, Harry J.

 
9781510692534: Extreme Ultraviolet Lithography

Synopsis

In this second edition of Extreme Ultraviolet Lithography, coverage is maintained on the fundamental aspects of EUV lithographic technology for topics such as exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced areas of technical focus, are also discussed. Many updates are included that reflect the significant advances in EUV lithography since the publication of the first edition. All topics are approached from the perspective of a practicing lithographer in a wafer fab, working in either manufacturing or development, and there are many references at the end of each chapter.

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.