Simulation of Deposition Processes With PECVD Apparatus: Theory and Applications - Couverture rigide

Geiser, Juergen; Arab, Meraa

 
9781621003656: Simulation of Deposition Processes With PECVD Apparatus: Theory and Applications
Couverture rigide
ISBN 10 : 1621003655 ISBN 13 : 9781621003656
Editeur : Nova Science Publishers Inc, 2012

Synopsis

This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.

Éditeur
Nova Science Publishers Inc
Date d'édition
2012
Langue
anglais
ISBN 10 
1621003655
ISBN 13 
9781621003656
Reliure
Relié
Nombre de pages
144
Coordonnées du fabricant
non disponible
Personne responsable
non disponible