Physical Design and Mask Synthesis for Directed Self-Assembly Lithography - Couverture souple

Shim, Seongbo; Shin, Youngsoo

 
9783030094553: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Couverture souple
ISBN 10 : 3030094553 ISBN 13 : 9783030094553
Editeur : Springer, 2019

Synopsis

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

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À propos de l?auteur

Seongbo Shim received B.S. and M.S. degrees in physics from Seoul National University, Korea, in 2004 and 2006 respectively, and a Ph.D. in electrical engineering from KAIST, Korea, in 2016. From 2006 to 2012, he was with the Semiconductor R&D Center, Samsung Electronics, where he was a Senior Engineer working on photolithography, computational lithography, optical proximity correction (OPC), and design for manufacturability (DFM) for advanced technologies. He has authored more than 40 papers on lithography, OPC, and DFM. He is the holder of 15 patents. His research interests include mask synthesis algorithms, VLSI CAD for the design-manufacturing interface, design technology co-optimization (DTCO) for emerging technologies, and machine learning for lithography optimizations.

Youngsoo Shin received B.S., M.S., and Ph.D. degrees in Electronics Engineering from Seoul National University, Korea. From 2001 to 2004, he was a Research Staff Member at the IBM T. J. Watson Research Center, Yorktown Heights, NY, USA. In 2004, he joined the Department of Electrical Engineering, KAIST, Korea, where he is currently a professor. He has served as a Program Chair of ICCD in 2014 and VLSI-SoC in 2015, and as a General Chair of ASP-DAC in 2018. He is an associate editor of IEEE Transactions on CAD and IEEE Design and Test. He is an IEEE Fellow.

Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.

Éditeur
Springer
Date d'édition
2019
Langue
anglais
ISBN 10 
3030094553
ISBN 13 
9783030094553
Reliure
Broché
Nombre de pages
152
Coordonnées du fabricant
ProductSafety@springernature.com
ProductSafety@springernature.com

Poststr. 9
Darmstadt
64293
Allemagne

Autres éditions populaires du même titre

9783319762937: Physical Design and Mask Synthesis for Directed Self-assembly Lithography

Edition présentée

ISBN 10 :  3319762931 ISBN 13 :  9783319762937
Editeur : Springer International Publishin..., 2018
Couverture rigide