Ultra Clean Processing of Semiconductor Surfaces XII: Selected, Peer Reviewed Papers from the 12th International Symposium on Ultra Clean Processing ... September 21-24, 2014, Brussels, Belgium - Couverture souple

 
9783038352426: Ultra Clean Processing of Semiconductor Surfaces XII: Selected, Peer Reviewed Papers from the 12th International Symposium on Ultra Clean Processing ... September 21-24, 2014, Brussels, Belgium

Synopsis

Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium.
The 71 papers are grouped as follows:
Chapter 1: Cleaning for FEOL Applications,
Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area,
Chapter 3: Wet Etching for FEOL Applications,
Chapter 4: Wet Processing of High Aspect Ratio Structures,
Chapter 5: Fluid Dynamics, Cleaning Mechanics,
Chapter 6: Photo Resist Performance and Rework,
Chapter 7: Cleaning for BEOL Interconnect Applications,
Chapter 8: Cleaning for 3D Applications,
Chapter 9: Contamination Control and AMC,
Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.