Collection of selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium.
The 71 papers are grouped as follows:
Chapter 1: Cleaning for FEOL Applications,
Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area,
Chapter 3: Wet Etching for FEOL Applications,
Chapter 4: Wet Processing of High Aspect Ratio Structures,
Chapter 5: Fluid Dynamics, Cleaning Mechanics,
Chapter 6: Photo Resist Performance and Rework,
Chapter 7: Cleaning for BEOL Interconnect Applications,
Chapter 8: Cleaning for 3D Applications,
Chapter 9: Contamination Control and AMC,
Chapter 10: Cleaning and Wet Etching for Semiconductor Photo-Voltaic Cells
Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.
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paperback. Etat : Very Good. Ultra Clean Processing of Semiconductor Surfaces XII: Volume 219 (Solid State Phenomena, Volume 219) This book is in very good condition and will be shipped within 24 hours of ordering. The cover may have some limited signs of wear but the pages are clean, intact and the spine remains undamaged. This book has clearly been well maintained and looked after thus far. Money back guarantee if you are not satisfied. See all our books here, order more than 1 book and get discounted shipping. . N° de réf. du vendeur 7719-9783038352426
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Vendeur : Bahamut Media, Reading, Royaume-Uni
paperback. Etat : Very Good. Shipped within 24 hours from our UK warehouse. Clean, undamaged book with no damage to pages and minimal wear to the cover. Spine still tight, in very good condition. Remember if you are not happy, you are covered by our 100% money back guarantee. N° de réf. du vendeur 6545-9783038352426
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