Design for Manufacturability With Advanced Lithography - Couverture rigide

Yu, Bei; Pan, David Z.

Couverture rigide

ISBN 10 : 3319203843 ISBN 13 : 9783319203843

Editeur : Springer International Publishing AG, 2015

Synopsis

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Détails de l'édition

• Éditeur: Springer International Publishing AG
• Date d'édition: 2015
• Langue: anglais
• ISBN 10: 3319203843
• ISBN 13: 9783319203843
• Reliure: Relié
• Numéro d'édition: 1
• Nombre de pages: 175
• Coordonnées du fabricant: ProductSafety@springernature.com; ProductSafety@springernature.com; ; Poststr. 9; Darmstadt; 64293; Allemagne