Particle Beam Microanalysis: Fundamentals, Methods and Applications - Couverture rigide

Fuchs, Ekehard; Etc.; Rehme, Hans; Oppolzer, Helmut

Couverture rigide

ISBN 10 : 3527268847 ISBN 13 : 9783527268849

Editeur : Wiley-VCH Verlag GmbH, 1990

Synopsis

This is an account of all particle ray methods used in the analysis of materials and material treatment processes. This book describes the physical and technical fundamentals, development and function of the apparatus as well as the most important applications. The book is aimed at the practitioner and formula content has been kept to a minimum.

A propos du livre

Quatrième de couverture

Fuchs, Oppolzer, Rehme Particle Beam Microanalysis Fundamentals, Methods and Applications Particle beam methods of microanalysis allow high lateral and vertical resolution, high sensitivity, low detection limits, and high accuracy. This book concentrates on methods which complement each other and can be routinely applied in industrial laboratories: scanning and transmission electron microscopy, electron beam X–ray microanalysis, Auger electron microanalysis, and ion beam microanalysis as well as electron beam testing. The principal aim of this book is to support the analyst in his practical work. The theoretical basis is treated only to the extent required to obtain an understanding of the physical fundamentals and to allow effective use of the analytical instruments. The mode of operation of the instruments, the preparation of specimens, the evaluation of the measured signals as well as the detection limits are described in detail. A selection of practical examples drawn mainly from the field of semiconductor technology demonstrates the range of applications and the limitations of the various particle beam methods.

Présentation de l'éditeur

Particle beam methods of microanalysis allow high lateral and vertical resolution, high sensitivity, low detection limits, and high accuracy. This book concentrates on methods which complement each other and can be routinely applied in industrial laboratories: scanning and transmission electron microscopy, electron beam X–ray microanalysis, Auger electron microanalysis, and ion beam microanalysis as well as electron beam testing. The principal aim of this book is to support the analyst in his practical work. The theoretical basis is treated only to the extent required to obtain an understanding of the physical fundamentals and to allow effective use of the analytical instruments. The mode of operation of the instruments, the preparation of specimens, the evaluation of the measured signals as well as the detection limits are described in detail. A selection of practical examples drawn mainly from the field of semiconductor technology demonstrates the range of applications and the limitations of the various particle beam methods.

Détails de l'édition

• Éditeur: Wiley-VCH Verlag GmbH
• Date d'édition: 1990
• Langue: anglais
• ISBN 10: 3527268847
• ISBN 13: 9783527268849
• Reliure: Relié
• Nombre de pages: 600
• Coordonnées du fabricant: non disponible
• Personne responsable: non disponible