X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis - Couverture rigide

Chung, Deborah D. L.; Et Al

Couverture rigide

ISBN 10 : 3527278427 ISBN 13 : 9783527278428

Editeur : Wiley-VCH Verlag GmbH, 1993

Synopsis

This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.

Détails de l'édition

• Éditeur: Wiley-VCH Verlag GmbH
• Date d'édition: 1993
• Langue: anglais
• ISBN 10: 3527278427
• ISBN 13: 9783527278428
• Reliure: Relié
• Nombre de pages: 272
• Coordonnées du fabricant: non disponible
• Personne responsable: non disponible