Synopsis
Fundamental Concepts of Ion-Beam Processing.- Precipitate and Microstructural Stability in Alloys Subjected to Sustained Irradiation.- Spontaneous Patterning of Surfaces by Low-Energy Ion Beams.- Ion-Beam-Induced Amorphization and Epitaxial Crystallization of Silicon.- Voids and Nanocavities in Silicon.- Damage Formation and Evolution in Ion-Implanted Crystalline Si.- Point Defect Kinetics and Extended-Defect Formation during Millisecond Processing of Ion-Implanted Silicon.- Magnetic Properties and Ion Beams: Why and How.- Structure and Properties of Nanoparticles Formed by Ion Implantation.- Metal Nanoclusters for Optical Properties.- Ion Beams in the Geological Sciences.- Ion-Beam Modification of Polymer Surfaces for Biological Applications.
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À propos de l?auteur
Harry Bernas is Research Director at the French National Research Center (CNRS). He has held various positions related to interdisciplinary research in CNRS, and was founding coordinator of the European COST program on Plasma- and Ion- Surface Engineering. He has authored over 200 papers in international journals and holds several patents. His main research interests are the study and control of materials nonequilibrium properties in metallic and oxide glasses, metal hydrides, semiconductors and metals under irradiation. In recent years, he has concentrated on the control via ion irradiation of magnetic properties in metallic nanostructures, and on the beam-controlled synthesis and optical properties of semiconductor and metal nanoclusters in glasses. He can be reached at bernas@csnsm.in2p3.fr.
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