Articles liés à Transient Properties of HiPIMS Discharges
Synopsis
HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.
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Présentation de l'éditeur
HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.
Biographie de l'auteur
Dr. Anurag Mishra is a senior researcher in Advanced Material Science and Engineering, Sungkyunkwan University, South Korea. He has his PhD from The University of Liverpool, United Kingdom. His work is on transient phenomena in High Power Impulse Magnetron Sputtering (HiPIMS) discharges. Dr. Mishra’s current research interests are Large
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Transient Properties of HiPIMS Discharges
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Scholars\' Press, 2014
ISBN 10 : 3639716469
ISBN 13 : 9783639716467
Neuf
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Vendeur : moluna, Greven, Allemagne
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Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Mishra AnuragDr. Anurag Mishra is a senior researcher in Advanced Material Science and Engineering, Sungkyunkwan University, South Korea. He has his PhD from The University of Liverpool, United Kingdom. His work is on transient pheno. N° de réf. du vendeur 4999667
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Transient Properties of HiPIMS Discharges
impression à la demandeVendeur : AHA-BUCH GmbH, Einbeck, Allemagne
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Taschenbuch. Etat : Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions. N° de réf. du vendeur 9783639716467
Quantité disponible : 1 disponible(s)
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Transient Properties of HiPIMS Discharges
Edité par
Scholars' Press Mai 2014, 2014
ISBN 10 : 3639716469
ISBN 13 : 9783639716467
Neuf
Taschenbuch
Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions. 212 pp. Englisch. N° de réf. du vendeur 9783639716467
Quantité disponible : 1 disponible(s)
Image fournie par le vendeur
Transient Properties of HiPIMS Discharges
Edité par
Scholars' Press Mai 2014, 2014
ISBN 10 : 3639716469
ISBN 13 : 9783639716467
Neuf
Taschenbuch
Vendeur : buchversandmimpf2000, Emtmannsberg, BAYE, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. Neuware -HiPIMS (High Power Impulse Magnetron Sputtering) is a relatively new highly ionized sputtering technique used to deposit engineering quality thin films, with the advantage that the deposition flux can be guided to the substrate through the electrical biasing. As the technique is on the verge of being adopted by the industries, it is necessary to understand its physics very well so that thin films with tailored properties can be deposited. Therefore, time-resolved diagnostic studies have been carried out to get better physical insight of the HiPIMS processes. This book also provides information of lower deposition rates in HiPIMS discharge and suggests its solutions.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 212 pp. Englisch. N° de réf. du vendeur 9783639716467
Quantité disponible : 2 disponible(s)