In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.
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Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas. 176 pp. Englisch. N° de réf. du vendeur 9783659539350
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Vendeur : moluna, Greven, Allemagne
Kartoniert / Broschiert. Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Gadipelly Anil KumarDr. Anil Kumar Gadipelly did his M.Sc from University of Hyderabad and completed his Ph.D in Physics from Osmania University, Hyderabad. His area of research includes metal oxide based thin films for gas sensing a. N° de réf. du vendeur 16224351
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Vendeur : preigu, Osnabrück, Allemagne
Taschenbuch. Etat : Neu. RF- Sputtered Cadmium Oxide thin films for gas sensing application | Anil Kumar Gadipelly (u. a.) | Taschenbuch | 176 S. | Englisch | 2015 | LAP LAMBERT Academic Publishing | EAN 9783659539350 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu. N° de réf. du vendeur 104869809
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Vendeur : buchversandmimpf2000, Emtmannsberg, BAYE, Allemagne
Taschenbuch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 176 pp. Englisch. N° de réf. du vendeur 9783659539350
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Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
Taschenbuch. Etat : Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas. N° de réf. du vendeur 9783659539350
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