Synopsis
Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.
Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.
Résultats de recherche pour Chemical Etching Behaviour of a Polyimide
Image d'archives
Chemical Etching Behaviour of a Polyimide
Vendeur : California Books, Miami, FL, Etats-Unis
Évaluation du vendeur 4 sur 5 étoiles
Etat : New. N° de réf. du vendeur I-9783668084186
Acheter neuf
EUR 26,11
Livraison gratuite
Expédition nationale : Etats-Unis
Expédition nationale : Etats-Unis
Quantité disponible : Plus de 20 disponibles
Image fournie par le vendeur
Chemical Etching Behaviour of a Polyimide
impression à la demandeVendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample. 28 pp. Englisch. N° de réf. du vendeur 9783668084186
Acheter neuf
EUR 17,95
Expédition à EUR 23
Expédition depuis Allemagne vers Etats-Unis
Expédition depuis Allemagne vers Etats-Unis
Quantité disponible : 2 disponible(s)
Image fournie par le vendeur
Chemical Etching Behaviour of a Polyimide
Edité par
GRIN Verlag, GRIN Verlag Nov 2015, 2015
ISBN 10 : 3668084181
ISBN 13 : 9783668084186
Neuf
Taschenbuch
Vendeur : buchversandmimpf2000, Emtmannsberg, BAYE, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.Books on Demand GmbH, Überseering 33, 22297 Hamburg 28 pp. Englisch. N° de réf. du vendeur 9783668084186
Acheter neuf
EUR 17,95
Expédition à EUR 60
Expédition depuis Allemagne vers Etats-Unis
Expédition depuis Allemagne vers Etats-Unis
Quantité disponible : 1 disponible(s)
Image fournie par le vendeur
Chemical Etching Behaviour of a Polyimide
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. Druck auf Anfrage Neuware - Printed after ordering - Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample. N° de réf. du vendeur 9783668084186
Acheter neuf
EUR 17,95
Expédition à EUR 60,28
Expédition depuis Allemagne vers Etats-Unis
Expédition depuis Allemagne vers Etats-Unis
Quantité disponible : 1 disponible(s)
Image fournie par le vendeur
Chemical Etching Behaviour of a Polyimide
Vendeur : preigu, Osnabrück, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. Chemical Etching Behaviour of a Polyimide | Deep Shikha | Taschenbuch | 28 S. | Englisch | 2015 | GRIN Verlag | EAN 9783668084186 | Verantwortliche Person für die EU: GRIN Publishing GmbH, Waltherstr. 23, 80337 München, info[at]grin[dot]com | Anbieter: preigu. N° de réf. du vendeur 104127984
Acheter neuf
EUR 17,95
Expédition à EUR 70
Expédition depuis Allemagne vers Etats-Unis
Expédition depuis Allemagne vers Etats-Unis
Quantité disponible : 5 disponible(s)