Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.
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Destinations, frais et délaisVendeur : Phatpocket Limited, Waltham Abbey, HERTS, Royaume-Uni
Etat : Good. Your purchase helps support Sri Lankan Children's Charity 'The Rainbow Centre'. Ex-library, so some stamps and wear, but in good overall condition. Our donations to The Rainbow Centre have helped provide an education and a safe haven to hundreds of children who live in appalling conditions. N° de réf. du vendeur Z1-A-012-02587
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Hardcover. Etat : Very Good. Hardcover, viii + 237 pages, NOT ex-library. Very good interior, clean, with unmarked text, free of inscriptions and stamps, firmly bound. Boards show small indentations to edges. Issued without a dust jacket. -- Contents: 1. Atomistic Models: -- Lattice Gas Models and Kinetic Monte Carlo Simulations of Epitaxial Growth / Michael Biehl; Cluster Diffusion and Island Formation on fcc(111) Metal Surfaces Studied by Atomic Scale Computer Simulations / Karsten Albe, Michael Müller; A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes / Carlo Cavallotti; Off-lattice Kinetic Monte Carlo Simulations of Strained Heteroepitaxial Growth / Michael Biehl; Quasicontinuum Monte Carlo Simulation of Multilayer Surface Growth / Jason P. DeVita; 2. Step Flow Models: -- Introduction to Step Dynamics and Step Instabilities / Joachim Krug; A Finite Element Framework for Burton-Cabrera-Frank Equation / Frank Haußer, Axel Voigt; Edge Diffusion in Phase-Field Models for Epitaxial Growth / Andreas Rätz, Axel Voigt; Discretisation and Numerical Tests of a Diffuse-Interface Model with Ehrlich-Schwoebel Barrier / Felix Otto; Islands in the Stream: Electromigration-Driven Shape Evolution with Crystal Anisotropy / Philipp Kuhn, Joachim Krug; Simulation of Ostwald Ripening in Homoepitaxy / Frank Haußer, Axel Voigt; 3. Continuum Models: -- Continuum Models for Surface Growth / Martin Rost; Configurational Continuum Modelling of Crystalline Surface Evolution / Navot Israeli, Daniel Kandel; On Level Set Formulations for Anisotropic Mean Curvature Flow and Surface Diffusion / Ulrich Clarenz -- Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists. N° de réf. du vendeur 005910
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Hardcover. Etat : new. Hardcover. The book provides a summary of recent developments in modeling epitaxial growth, with emphasis on multi-scale approaches and numerical methods. It presents a compact overview and can serve as an introduction for applied mathematicians, theoretical physicists and computational material scientists into this highly active interdisciplinary field of research. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. Shipping may be from multiple locations in the US or from the UK, depending on stock availability. N° de réf. du vendeur 9783764372088
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Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Buch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists. 237 pp. Englisch. N° de réf. du vendeur 9783764372088
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Gebunden. Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Proceedings of an Oberwolfach Conference, suggested by K.-H. HoffmannFirst available overview of highly active research field in modeling epitaxial growthIntroduction given to kinetic Monte Carlo, step flow and continuum methodsState. N° de réf. du vendeur 449593989
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Vendeur : Books Puddle, New York, NY, Etats-Unis
Etat : New. pp. 237. N° de réf. du vendeur 264601937
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