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Exploration of Focused Ion Beam Processing: New nanofabrication stratgies using varioud FIB induced physical phenomena - Couverture souple

Tripathi, Sarvesh K

 
9783847333098: Exploration of Focused Ion Beam Processing: New nanofabrication stratgies using varioud FIB induced physical phenomena
Couverture souple
ISBN 10 : 3847333097 ISBN 13 : 9783847333098
Editeur : LAP LAMBERT Academic Publishing, 2011

Synopsis

The necessity of miniaturization of the devices expands the scope of nanotechnology. In recent years, researchers have poured in a lot of effort in the development of nanoscale devices. The focused ion beam (FIB) has proven itself as a very powerful and unique technique for nanofabrication. FIB induced micro / nanofabrication fundamentally involves two basic phenomena namely sputtering and molecular cracking, leading to the material removal and material deposition, respectively. In the present work the basic physical processes involved in the FIB induced deposition have been investigated and the correlation between ion beam parameters and physical characteristics of FIB fabricated nanostructures has been studied. There are a number of other physical phenomena viz. scattering, redeposition, secondary electron / photon emission and localized heating etc. which may occur when the incident ions interact with the substrate during the FIB processing, and intricately influence the nanofabrication. Therefore, it is very necessary to investigate the effect of these phenomena for efficient FIB processing. In the present work the influences of these physical phenomena have been explored.

Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.

Présentation de l'éditeur

The necessity of miniaturization of the devices expands the scope of nanotechnology. In recent years, researchers have poured in a lot of effort in the development of nanoscale devices. The focused ion beam (FIB) has proven itself as a very powerful and unique technique for nanofabrication. FIB induced micro / nanofabrication fundamentally involves two basic phenomena namely sputtering and molecular cracking, leading to the material removal and material deposition, respectively. In the present work the basic physical processes involved in the FIB induced deposition have been investigated and the correlation between ion beam parameters and physical characteristics of FIB fabricated nanostructures has been studied. There are a number of other physical phenomena viz. scattering, redeposition, secondary electron / photon emission and localized heating etc. which may occur when the incident ions interact with the substrate during the FIB processing, and intricately influence the nanofabrication. Therefore, it is very necessary to investigate the effect of these phenomena for efficient FIB processing. In the present work the influences of these physical phenomena have been explored.

Biographie de l'auteur

Sarvesh K Tripathi received his MSc (2006) and PhD (2010) degrees in Physics from Indian Institute of Technology Kanpur, India. Subsequently he carried out his Post Doctoral Work at Trinity College Dublin, Ireland. Currently, he is working for Intel Corporation in Leixlip, Ireland.

Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.

Éditeur
LAP LAMBERT Academic Publishing
Date d'édition
2011
Langue
anglais
ISBN 10 
3847333097
ISBN 13 
9783847333098
Reliure
Broché
Nombre de pages
156
Coordonnées du fabricant
non disponible
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