Design and Synthesis of Novel Organic Photo Imaging Compounds: Design and Synthesis of Novel Organic Photo Imaging Compounds and Their Nanotechnology Applications - Couverture souple

Vummadi, Venkat Reddy

 
9783848409389: Design and Synthesis of Novel Organic Photo Imaging Compounds: Design and Synthesis of Novel Organic Photo Imaging Compounds and Their Nanotechnology Applications
Couverture souple
ISBN 10 : 3848409380 ISBN 13 : 9783848409389
Editeur : LAP LAMBERT Academic Publishing, 2012

Synopsis

This Thesis discusses the basic principles of Lithographic techniques incorporating the use of positive and negative photoresists applications, synthetic techniques of photo imaging compounds and light sensitive materials, uses of novel chlorinating agents at mild conditions, direct esterification of sulfonicacid or salts, photochemical studies of photo activating compounds, resolution and optimization of the photo imaging compounds in nanolithographic applications. Preparative and HPLC standardization methods of photo activating compounds. Synthesis of photo acid generators for nanotechnology applications, these are used in the microelectronic industry. The microelectronic industry has made remarkable progress with the development of integrated circuit (IC) technology. Although EUV lithography at 13.5 nm wavelength has emerged as a promising candidate to meet the resolution requirements of the microelectronic industry roadmap, yet the development of advanced photoresist materials with all of the required imaging properties is still challenging and is one of the major subjects of current nanolithography research.

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Présentation de l'éditeur

This Thesis discusses the basic principles of Lithographic techniques incorporating the use of positive and negative photoresists applications, synthetic techniques of photo imaging compounds and light sensitive materials, uses of novel chlorinating agents at mild conditions, direct esterification of sulfonicacid or salts, photochemical studies of photo activating compounds, resolution and optimization of the photo imaging compounds in nanolithographic applications. Preparative and HPLC standardization methods of photo activating compounds. Synthesis of photo acid generators for nanotechnology applications, these are used in the microelectronic industry. The microelectronic industry has made remarkable progress with the development of integrated circuit (IC) technology. Although EUV lithography at 13.5 nm wavelength has emerged as a promising candidate to meet the resolution requirements of the microelectronic industry roadmap, yet the development of advanced photoresist materials with all of the required imaging properties is still challenging and is one of the major subjects of current nanolithography research.

Biographie de l'auteur

Dr. Venkat Reddy Vummadi born in India. He received Ph.D in 2006 from IICT, India, under the supervision of Dr. V. Jayathirtha Rao. He moved to UNCC, USA for postdoctoral studies. Later he joined at MIT, USA for higher studies. He received Young Scientist award from DST, India in 2012. Dr. Reddy is working as Scientist at Osmania University, HYD.

Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.

Éditeur
LAP LAMBERT Academic Publishing
Date d'édition
2012
Langue
anglais
ISBN 10 
3848409380
ISBN 13 
9783848409389
Reliure
Broché
Nombre de pages
148
Coordonnées du fabricant
non disponible
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