The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.
Vendeur : Alplaus Books, Alplaus, NY, Etats-Unis
Paperback. Etat : Good. Solid State Phenomena, Vols. 65-66. Name on first page, else no markings noted. Gentle usage wear. N° de réf. du vendeur 37215aaoz
Quantité disponible : 1 disponible(s)