Ultra Clean Processing of Silicon Surfaces V: Proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces Ucpss 2002 Held in Ostend, Belgium, September 2002 - Couverture souple

 
9783908450788: Ultra Clean Processing of Silicon Surfaces V: Proceedings of the Fifth International Symposium on Ultra Clean Processing of Silicon Surfaces Ucpss 2002 Held in Ostend, Belgium, September 2002

Synopsis

The issues addressed by the Sixth International Symposium on the Ultra Clean Processing of Silicon Surfaces included all aspects of ultra-clean Si-technology, cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
This covered studies of Si-surface chemistry and topography and its relationship to device performance and process yield, cleaning in relationship to new gate stacks, cleaning at the interconnect level, resist stripping and polymer removal, cleaning and contamination control of various new materials, wafer backside cleaning and cleaning following Chemical-Mechanical-Polishing (CMP).

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