Ultra Clean Processing of Semiconductor Surfaces IX: Ucpss 2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (Ucpss) Held in Bruges, Belgium, September 22-24, 2008 - Couverture souple

 
9783908451648: Ultra Clean Processing of Semiconductor Surfaces IX: Ucpss 2008, 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (Ucpss) Held in Bruges, Belgium, September 22-24, 2008

Synopsis

Volume is indexed by Thomson Reuters CPCI-S (WoS).
The contents of this publication include every conceivable issue related to contamination, cleaning and surface preparation during mainstream large-scale integrated circuit manufacture. Typically, silicon is used as the main semiconductor substrate. However, other semiconducting materials such as SiGe and SiC are currently being used in the source-sink junction areas, and materials such as Ge and III-V compounds are being considered for the transistor channel region of future-generation devices.

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