Sputter Cleaning: Plasma, Cleaning, Solid, Physics, Vacuum, Technology - Couverture souple

Couverture souple

ISBN 10 : 6139044987 ISBN 13 : 9786139044986

Editeur : OmniScriptum, 2026

Synopsis

Please note that the content of this book primarily consists of articles available from Wikipedia or other free sources online. Sputter cleaning is the cleaning of a solid surface in a vacuum by using physical sputtering of the surface. Sputter cleaning is often used in vacuum deposition and ion plating. In 1955 Farnsworth, Schlier, George, and Burger reported using sputter cleaning in an ultra-high-vacuum system to prepare ultra-clean surfaces for low-energy electron-diffraction (LEED) studies. Sputter cleaning became an integral part of the ion plating process. Sputter cleaning has some potential problems such as overheating, gas incorporation in the surface region, bombardment (radiation) damage in the surface region, and the roughening of the surface, particularly if over done. It is important to have a clean plasma in order to not continually recontaminate the surface during sputter cleaning. Redeposition of sputtered material on the substrate can also give problems, especially at high sputtering pressures.

Détails de l'édition

• Éditeur: OmniScriptum
• Date d'édition: 2026
• Langue: anglais
• ISBN 10: 6139044987
• ISBN 13: 9786139044986
• Reliure: Broché
• Nombre de pages: 72
• Éditeur: Meghan Jessalyn Blossom
• Coordonnées du fabricant: non disponible
• Personne responsable: non disponible