Synopsis
"Micro-electronic Processes for VLSI Fabrication" is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes.
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Micro-electronic Processes for VLSI Fabrication
Edité par
LAP LAMBERT Academic Publishing Jul 2023, 2023
ISBN 10 : 6206753204
ISBN 13 : 9786206753209
Neuf
Taschenbuch
Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -'Micro-electronic Processes for VLSI Fabrication' is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes. 204 pp. Englisch. N° de réf. du vendeur 9786206753209
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EUR 79,90
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Expédition depuis Allemagne vers Etats-Unis
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Micro-electronic Processes for VLSI Fabrication
Edité par
LAP LAMBERT Academic Publishing, 2023
ISBN 10 : 6206753204
ISBN 13 : 9786206753209
Neuf
Couverture souple
Vendeur : moluna, Greven, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Autor/Autorin: Mukherjee Dr. DebasisDr. Debasis Mukherjee is an Associate Professor in the Department of Electronics and Communication Engineering at the Brainware University. He has guided two research scholars to Ph.D. degree. Micro-electroni. N° de réf. du vendeur 1071993895
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Expédition depuis Allemagne vers Etats-Unis
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Micro-electronic Processes for VLSI Fabrication
Edité par
LAP LAMBERT Academic Publishing Jul 2023, 2023
ISBN 10 : 6206753204
ISBN 13 : 9786206753209
Neuf
Taschenbuch
Vendeur : buchversandmimpf2000, Emtmannsberg, BAYE, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -'Micro-electronic Processes for VLSI Fabrication' is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes.VDM Verlag, Dudweiler Landstraße 99, 66123 Saarbrücken 204 pp. Englisch. N° de réf. du vendeur 9786206753209
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EUR 79,90
Expédition à EUR 60
Expédition depuis Allemagne vers Etats-Unis
Expédition depuis Allemagne vers Etats-Unis
Quantité disponible : 1 disponible(s)
Image d'archives
Micro-electronic Processes for VLSI Fabrication
Edité par
LAP LAMBERT Academic Publishing, 2023
ISBN 10 : 6206753204
ISBN 13 : 9786206753209
Neuf
Taschenbuch
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - 'Micro-electronic Processes for VLSI Fabrication' is a comprehensive and authoritative guide that delves into the fundamental principles and advanced techniques used in the fabrication of Very Large Scale Integrated (VLSI) circuits. Covering a wide array of topics, the book begins with an in-depth introduction to Silicon Semiconductor Technology, including an overview of semiconductor materials, the crystal structure of silicon, intrinsic and extrinsic semiconductors, and the intricacies of doping and carrier concentration. Subsequent chapters delve into crucial aspects of VLSI fabrication, exploring wafer processing techniques, such as growth, preparation, defect inspection, and various wafer cleaning methods. The critical process of oxidation is covered in detail, explaining thermal, dry, and wet oxidation techniques along with oxide growth models.The book extensively examines epitaxial deposition methods, including Chemical Vapor Deposition (CVD), Molecular Beam Epitaxy (MBE), and selective epitaxy. Ion implantation and diffusion, pivotal processes for semiconductor device fabrication, are also meticulously discussed, with insights into ion implantation processes. N° de réf. du vendeur 9786206753209
Acheter neuf
EUR 80,86
Expédition à EUR 61,61
Expédition depuis Allemagne vers Etats-Unis
Expédition depuis Allemagne vers Etats-Unis
Quantité disponible : 1 disponible(s)