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Plasma Etching and Its Application in Large-Scale Integrated Circuit Manufacturing (2nd Edition) (High-End Integrated Circuit Manufacturing Process Series)(Chinese Edition)
Edité par
Tsinghua University Press, 2023
ISBN 10 : 7302614393
ISBN 13 : 9787302614395
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paperback
Vendeur : liu xing, Nanjing, JS, Chine
Évaluation du vendeur 5 sur 5 étoiles
paperback. Etat : New. Paperback. Pub Date: 2023-01 Pages: 423 Language: Chinese Publisher: Tsinghua University Press Plasma Etching and Its Application in Large-Scale Integrated Circuit Manufacturing (2nd Edition) (High-end Integrated Circuit Manufacturing Process Series) has 10 chapters. which comprehensively introduces the application and potential development direction of low-temperature plasma etching technology in the semiconductor industry based on public literature. It starts with the development history of. N° de réf. du vendeur DR008100
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