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Language:Chinese.paperback.Pub Date:2024-09.publisher:Intellectual Property Publishing House.description:Paperback. Pub Date: 2024-09 Pages: 218 Publisher: Intellectual Property Publishing House This book innovatively conducts a dual-line linkage and dual-dimensional positioning analysis. focusing on the patent layout of key core technologies in the sem
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Key Technologies for Semiconductor Metrology from a Patent Perspective(Chinese Edition)
Edité par
Intellectual Property Publishing House, 2024
ISBN 10 : 7513094969
ISBN 13 : 9787513094962
Neuf
paperback
Vendeur : liu xing, Nanjing, JS, Chine
Évaluation du vendeur 5 sur 5 étoiles
paperback. Etat : New. Language:Chinese.Paperback. Pub Date: 2024-09 Pages: 218 Publisher: Intellectual Property Publishing House This book innovatively conducts a dual-line linkage and dual-dimensional positioning analysis. focusing on the patent layout of key core technologies in the semiconductor industry and the layout of key applicants. The research content closely follows the current urgent needs of the industry and future development trends. providing strong support for existing scientific research and effec. N° de réf. du vendeur DT023227
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EUR 122,06
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Expédition depuis Chine vers Etats-Unis
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