This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination on surfaces as well as ways to remove such contamination from a wide variety of surfaces. The technological areas where surface contamination has always been a bete noire and thus surface cleaning is of cardinal importance are too many and range from aerospace to microelectronics to biomedical. This volume contains a total of 24 papers, all rigorously peer reviewed and revised before inclusion, which deal with all kinds of contaminations on a host of surfaces. The topics covered include: mapping of surface contaminants; various techniques for cleaning surfaces; various techniques for monitoring level of cleanliness; acceptable cleanliness levels; ionic contamination; pharmaceutical cleaning validations; cleaning of glass surfaces; decontamination of sensitive equipment; no-chemistry process cleaning; waterjet cleaning; cleaning with solid carbon dioxide pellet blasting; cleanroom wipers; dust removal from solar panels and spacecraft on Mars; laser cleaning of silicon surfaces; particle removal; implications of surface contamination and cleaning; and future of industrial cleaning and related public policy-making.
Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.
Kash L. Mittal
Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.
Vendeur : Universitätsbuchhandlung Herta Hold GmbH, Berlin, Allemagne
1st ed. 16 x 23 cm. 364 pages. HC Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Sprache: Englisch. N° de réf. du vendeur 9332VB
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Hardcover. Etat : new. Hardcover. This volume documents the proceedings of the "International Symposium on Surface Contamination and Cleaning", held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyze and characterize contamination on surfaces as well as ways to remove such contamination from a wide variety of surfaces. The technological areas where surface contamination has always been a bete noire and thus surface cleaning is of cardinal importance are too many and range from aerospace to microelectronics to biomedical. This volume contains a total of 24 papers, all peer reviewed and revised before inclusion, which deal with all kinds of contamination on a host of surfaces.The topics covered include: mapping of surface contaminations; various techniques for cleaning surfaces; various techniques for monitoring level of cleanliness; acceptable cleanliness levels; ionic contamination; pharmaceutical cleaning validations; cleaning of glass surfaces; decontamination of sensitive equipment; no-chemistry process cleaning; waterjet cleaning; cleaning with solid carbon dioxide pellet blasting; cleanroom wipers; dust removal from solar panels and spacecraft on Mars; laser cleaning of silicon surfaces; particle removal; implications of surface contamination and cleaning; and future of industrial cleaning and related public policy-making. This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001 Shipping may be from multiple locations in the US or from the UK, depending on stock availability. N° de réf. du vendeur 9789067643764
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Vendeur : moluna, Greven, Allemagne
Gebunden. Etat : New. Kash L. MittalThis volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tre. N° de réf. du vendeur 909495828
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