Applied Photometry, Radiometry, and Measurements of Optical Losses - Couverture rigide

Livre 51 sur 160: Springer Series in Optical Sciences

Bukshtab, Michael

 
9789400721647: Applied Photometry, Radiometry, and Measurements of Optical Losses

Synopsis

Applied Photometry, Radiometry, and Measurements of Optical Losses reviews and analyzes physical concepts of radiation transfer, providing a quantitative foundation for the means of measurements of optical losses, which affect propagation and distribution of light waves in various media.

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À propos de l?auteur

Michael A Bukshtab received M.S. and Ph.D. degrees in "Optical Design and Spectroscopy" and in "Physical Optics" from The Technical University of Fine Mechanics & Optics and from The Vavilov' State Optical Institute, and had post-doctoral tenure analyzing high-purity silica glasses and specialty fibers in The Institute of Silicate Chemistry, Academy of Sciences - all in St. Petersburg (Leningrad), Russia. His M.S. thesis received the Best Diploma award among nearly 30 Leningrad technical universities and was published in "Measurement Techniques" in 1978. Michael's monograph "The Low Loss Measurement Techniques", 165 pages, was published in 1988 by Energoatomizdat, Moscow-Leningrad. Another book: M.A. Bukshtab, A. S. Doynikov, and V. N. Koromislichenko, "Photometry and Radiometry for Engineers" (editors M. A. Bukshtab and A. A. Wolkenstein) by Polytechnika, Leningrad (St. Petersburg), 1991, was announced for publication, book proofs were printed, but manuscript was left unpublished, as Michael immigrated to the USA. Michael was elected by employees the Board Chairman of Leningrad's Institute of Telecommunications, where he served from 1989 until immigrating in 1991. In USA Michael worked on design, development, and fabrication of optical systems and components for such companies as Sandoz, Corning, Pirelli, Kodak, CIENA, Lucent, and GE Advanced Materials. Michael latest experience via Michael A Bukshtab Consulting includes designing complex systems and components and investigating various optical properties -measurement of color-shifting, polarization-dependent, backreflection, backscattering and other low-loss related phenomena, designing all-optical wavelength-switching and cross-connect systems and OADM networks, working on terabit optical routers and optical backplanes, investigating EUV lithography systems, interferometric and diffraction-based positioning sensors, improving fiber-laser and EDFA-based air-to-groundranging lidars. Michael has authored and coauthored more than 30 Patents or Invention Certificates and participated in more than 70 Scientific Publications and Conference Presentations.

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Autres éditions populaires du même titre

9789401785266: Applied Photometry, Radiometry, and Measurements of Optical Losses

Edition présentée

ISBN 10 :  9401785260 ISBN 13 :  9789401785266
Editeur : Springer, 2014
Couverture souple