This volume provides a timely description of the latest compact Mos transistor models for circuit simulation. The first generation Bsim3 and Bsim4 models that have dominated circuit simulation in the last decade are no longer capable of characterizing all the important features of modern sub-100nm Mos transistors. This book discusses the second generation Mos transistor models that are now in urgent demand and being brought into the initial phase of manufacturing applications. It considers how the models are to include the complete drift-diffusion theory using the surface potential variable in the Mos transistor channel in order to give one characterization equation.
Les informations fournies dans la section « Synopsis » peuvent faire référence à une autre édition de ce titre.
This volume provides a timely description of the latest compact Mos transistor models for circuit simulation. The first generation Bsim3 and Bsim4 models that have dominated circuit simulation in the last decade are no longer capable of characterizing all the important features of modern sub-100nm Mos transistors. This book discusses the second generation Mos transistor models that are now in urgent demand and being brought into the initial phase of manufacturing applications. It considers how the models are to include the complete drift-diffusion theory using the surface potential variable in the Mos transistor channel in order to give one characterization equation.
Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.
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Paperback. Etat : new. Paperback. This volume provides a timely description of the latest compact MOS transistor models for circuit simulation. The first generation BSIM3 and BSIM4 models that have dominated circuit simulation in the last decade are no longer capable of characterizing all the important features of modern sub-100nm MOS transistors. This book discusses the second generation MOS transistor models that are now in urgent demand and being brought into the initial phase of manufacturing applications. It considers how the models are to include the complete drift-diffusion theory using the surface potential variable in the MOS transistor channel in order to give one characterization equation. Shipping may be from multiple locations in the US or from the UK, depending on stock availability. N° de réf. du vendeur 9789813203310
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