Photoresist Technology in Microsystems: Principles, Processes and Applications - Couverture rigide

Wang, Kaiying

9789819516056: Photoresist Technology in Microsystems: Principles, Processes and Applications

Couverture rigide

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

Editeur : Springer Verlag, Singapore, 2025

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�diteur: Springer Verlag, Singapore
Date d'�dition: 2025
Langue: anglais
ISBN 10: 9819516056
ISBN 13: 9789819516056
Reliure: Reli�
Nombre de pages: 195
Coordonn�es du fabricant: ProductSafety@springernature.com
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Photoresist Technology in Microsystems: Principles, Processes and Applications (eng)

Wang, Kaiying

Edit� par Springer, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

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Photoresist Technology in Microsystems: Principles, Processes and Applications

Wang, Kaiying

Edit� par Springer Verlag GmbH, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

Neuf Couverture rigide

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Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. N� de r�f. du vendeur 2528504384

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Photoresist Technology in Microsystems: Principles, Processes and Applications

Kaiying Wang

Edit� par Springer-Verlag Gmbh Okt 2025, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

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Buch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements. 183 pp. Englisch. N� de r�f. du vendeur 9789819516056

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Photoresist Technology in Microsystems: Principles, Processes and Applications (Hardcover)

Kaiying Wang

Edit� par Springer Verlag, Singapore, Singapore, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

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Hardcover. Etat : new. Hardcover. This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements. Shipping may be from multiple locations in the US or from the UK, depending on stock availability. N� de r�f. du vendeur 9789819516056

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Photoresist Technology in Microsystems: Principles, Processes and Applications

Kaiying Wang

Edit� par Springer, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

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Photoresist Technology in Microsystems: Principles, Processes and Applications

Kaiying Wang

Edit� par Springer, Springer Okt 2025, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

Neuf Couverture rigide

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Buch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 196 pp. Englisch. N� de r�f. du vendeur 9789819516056

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Photoresist Technology in Microsystems: Principles, Processes and Applications

Kaiying Wang

Edit� par Springer, Springer, 2025

ISBN 10 : 9819516056 ISBN 13 : 9789819516056

Neuf Couverture rigide

Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne

�valuation du vendeur 5 sur 5 �toiles

Buch. Etat : Neu. Druck auf Anfrage Neuware - Printed after ordering - This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications. This book addresses this gap by providing a unified and up to-date exploration of photoresist technology, making it a timely and essential contribution to the field. The book balances theoretical depth with practical insights, making it accessible to readers with varying levels of expertise. The book is designed to cater to a broad audience, from students and researchers to industry professionals. A unique feature of this book is its emphasis on the interplay between material properties, processing techniques, and application-specific requirements. N� de r�f. du vendeur 9789819516056

Contacter le vendeur