Fundamental Electron Interactions with Plasma Processing Gases (Physics of Atoms and Molecules)

Loucas G. Christophorou; James K. Olthoff

ISBN 10: 0306480379 / ISBN 13: 9780306480379

Edité par Springer Science & Business Media, 2004

A propos de cet article

This hardcover volume by Loucas G. Christophorou and James K. Olthoff examines the physics of low-energy electron collisions with gas-phase molecules, with particular attention to species relevant to plasma-based semiconductor manufacturing. Published by Springer in 2003 as part of the Physics of Atoms and Molecules series, it surveys elastic scattering, excitation, ionization, attachment, and dissociation processes, drawing together cross-section data and rate coefficients for a range of plasma processing gases. The work serves as a reference for researchers in atomic and molecular physics, plasma chemistry, and microelectronics fabrication.

N° de réf. du vendeur SP-000000-shelf-36-1211

Détails bibliographiques

• Titre: Fundamental Electron Interactions with Plasma Processing Gases (Physics of Atoms and Molecules)
• Éditeur: Springer Science & Business Media
• Date de parution: 2004
• Langue: anglais
• ISBN à 10 chiffres: 0306480379
• ISBN à 13 chiffres: 9780306480379
• Reliure: Hardback
• État de l'article: New
• Dimensions: 14 L x 14 H x 4 P (en pouces) 14 pouces de largeur par 14 pouces de hauteur par 4 pouces de profondeur
• Poids: 4,7 livres

A propos de ce titre

Synopsis

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro- vides an up-to-date and comprehensive account of the fundamental in- teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in- elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the- art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Présentation de l'éditeur

This volume deals with the basic knowledge and understanding of the fundamental interactions of low-energy electrons with molecules. Recent advances in electron-molecule interaction processes are discussed and a unique up-to-date and comprehensive account of the fundamental interactions of low-energy electrons with molecules of current interest in modern technology, specially the semiconductor industry, is presented. The material provided in this volume will aid scientists and engineers working in many fields of basic and applied science and engineering. The unique and authoritative knowledge, information, and understanding it provides generically underpins advances in plasma, laser, lighting, discharge, environmental, radiation, and other technologies.