High-K Dielectrics And Metal Gates For Memory Applications: Investigation Of High-K Dielectrics And Metal Gate Electrodes For Floating Gate Non-Volatile Memory Applications

Jayanti, Srikant; Jayanti, Srikant

ISBN 10: 3846588474 / ISBN 13: 9783846588475

Edité par Lap Lambert Academic Publishing, 2012

252 pages. 8.66x5.91x0.57 inches. In Stock. N° de réf. du vendeur 3846588474

Synopsis :

Due to the increasing demand of non-volatile flash memories in the portable electronics, the device structures need to be scaled down drastically. However, the scalability of traditional floating gate structures beyond 20 nm NAND flash technology node is uncertain. In this regard, the use of metal gates and high-k dielectrics as the gate and interpoly dielectrics respectively, seem to be promising substitutes in order to continue the flash scaling beyond 20nm. Furthermore, research of novel memory structures to overcome the scaling challenges need to be explored. Through this work, the use of high-k dielectrics as IPDs in a memory structure has been studied. For this purpose, IPD process optimization and barrier engineering were explored to determine and improve the memory performance. Specifically, the concept of high-k / low-k barrier engineering was studied in corroboration with simulations. In addition, a novel memory structure comprising a continuous metal floating gate was investigated in combination with high-k blocking oxides. Both electrical and analytical characterization studies were undertaken to gain insight into the behavior of the memory layers in the structure.

Détails bibliographiques

Titre : High-K Dielectrics And Metal Gates For ...
Éditeur : Lap Lambert Academic Publishing
Date d'édition : 2012
Reliure : Paperback
Etat : Brand New