Magnetron Sputtered Copper Nitride Films for Optical Storage Devices

Venkata Subba Reddy Katherapalli

ISBN 10: 3659901415 / ISBN 13: 9783659901416

Edité par LAP LAMBERT Academic Publishing Jun 2016, 2016

A propos de cet article

Neuware -Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book.Books on Demand GmbH, Überseering 33, 22297 Hamburg 132 pp. Englisch.

N° de réf. du vendeur 9783659901416

Détails bibliographiques

• Titre: Magnetron Sputtered Copper Nitride Films for Optical Storage Devices
• Éditeur: LAP LAMBERT Academic Publishing Jun 2016
• Date de parution: 2016
• Langue: anglais
• ISBN à 10 chiffres: 3659901415
• ISBN à 13 chiffres: 9783659901416
• Reliure: Taschenbuch
• État de l'article: Neu

A propos de ce titre

Synopsis

Thin films of copper nitride received much attention because of their wide range of applications such as write-once optical recording, insulating barrier in magnetic tunnel junctions, generating microscopic copper lines by maskless laser writing or copper dots by maskless electron beam writing. The physical properties of the deposited films depend mainly on the deposition technique employed and the process parameters maintained during the growth of the films. This book restrains the optimized preparation condition of copper nitride films using dc reactive magnetron sputtering technique by precisely controlling the process parameters, and investigated the physical properties of the films. The promising approach to prepare the device quality copper nitride films for optical recording devices was discussed clearly in this book.

À propos de l?auteur

Dr.K.Venkata Subba Reddy has carried out research work on metal nitride thin films for optical storage devices, and he obtained Ph.D. Degree in Physics from S.V.University in the year 2007 under the supervision of Prof. S. Uthanna. At present he is working as a reader in the Department of Physics, S.B.V.R. Degree College, Badvel, A.P. Inida.