Optical Imaging in Projection Microlithography

Alfred K. Wong

ISBN 10: 0819458295 / ISBN 13: 9780819458292

Edité par SPIE Press, US, 2005

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. N° de réf. du vendeur LU-9780819458292

Synopsis :

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.

Détails bibliographiques

Titre : Optical Imaging in Projection ...
Éditeur : SPIE Press, US
Date d'édition : 2005
Reliure : Paperback
Etat : New
Edition : illustrated Edition.