Sputtering By Particle Bombardment Iii: Characteristics Of Sputtered Particles, Technical Applications

Rainer Behrisch, Klaus Wittmaack, R. Behrisch, W. Hauffe, W.O. Hofer, N. Laegreid, E.D. McClanahan, B.U.R. Sundqvist, K. Wittmaack, M.L. Yu,

ISBN 10: 3540534288 / ISBN 13: 9783540534280

Edité par Springer, 1991

This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide. N° de réf. du vendeur ABNR-157720

Synopsis :

Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described include surface and depth analysis, micromachining, and the production of surface coatings and thin films. This textbook on surface physics, materials science and semiconductor technology is intended for researchers in universities and industrial laboratories and also engineers.

Détails bibliographiques

Titre : Sputtering By Particle Bombardment Iii: ...
Éditeur : Springer
Date d'édition : 1991
Reliure : Couverture rigide
Etat : New