THIN FILMS FOR OPTICAL WAVEGUIDE DEVICES AND MATERIALS FOR OPTICAL LIMITING

KEIICHI NASHIMOTO, FUJI XEROX CO. LTD., JAPANRUTH PACHTER, AIR FORCE RESEARCH LABORATORY, U.S.A.BRUCE W. WESSELS, NORTHWESTERN UNIVERSITY, ILLINOISJOSEPH SHMULOVICH, LUCENT TECHNOLOGIES, NEW JERSEYALEX -K. -Y. JEN, UNIVERSITY OF WASHINGTONKEITH LEWIS, DEFENCE EVALUATION AND RESEARCH AGENCY, WORCESTERSHIRERICHARD SUTHERLAND, SCIENCE APPLICATIONS INTERNATIONAL CORP.JOSEPH W. PERRY, UNIVERSITY OF ARIZONA

ISBN 10: 1558995056 / ISBN 13: 9781558995055

Edité par Cambridge University Press, 2000

A propos de cet article

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Détails bibliographiques

• Titre: THIN FILMS FOR OPTICAL WAVEGUIDE DEVICES AND MATERIALS FOR OPTICAL LIMITING
• Éditeur: Cambridge University Press
• Date de parution: 2000
• Langue: anglais
• ISBN à 10 chiffres: 1558995056
• ISBN à 13 chiffres: 9781558995055
• Reliure: Couverture rigide
• État de l'article: Brand New

A propos de ce titre

Synopsis

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Présentation de l'éditeur

This book, first published in 2000, provides a multidisciplinary discussion of the science and technology of optical materials and devices for materials scientists, chemists, and physicists. Symposium Z, Thin Films for Optical Waveguide Devices, covers materials properties, thin-film processing and optical waveguide device integration. The range of thin films include ferroelectrics, dielectrics, glasses, and polymers with epitaxial, glass, or polymeric structures. Discussions of thin-film processing include sputtering, MBE, PLD, MOCVD, FHD, sol-gel, and spin casting for luminescent waveguides, electro-optic waveguides, magneto-optic waveguides, and photonic crystals. Symposium PP, Materials for Optical Limiting II, addresses the development of materials for optical limiters and tunable filters which can suppress undesired radiation. Topics include two-photon absorbers and photorefractives, as well as continued emphasis on reverse saturable absorption, liquid crystals, and carbon-based suspensions. It also covers new materials modeling and synthesis, nonlinear materials characterization, device applications using new materials and analyses of materials impact on optical limiting applications.