Plasma Etching: An Introduction - Couverture rigide

 
9780124693708: Plasma Etching: An Introduction

Synopsis

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

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Revue de presse

"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
--AUSTRALIAN PHYSICIST
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS

Présentation de l'éditeur

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

Les informations fournies dans la section « A propos du livre » peuvent faire référence à une autre édition de ce titre.

Autres éditions populaires du même titre

9780123959669: Plasma Etching: An Introduction

Edition présentée

ISBN 10 :  0123959667 ISBN 13 :  9780123959669
Editeur : Academic Press, 2016
Couverture souple