flamm daniel (23 résultats)

Etat : Near Fine. Hardover, [xii], 476 pages. Near Fine condition. Size 9.25"x6.25". "Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods." Book has very light exterior shelfwear. Previous owner's name on front fly, else Fine condition, clean and unmarked.

Hardcover. Etat : Fair. 1. The item might be beaten up but readable. May contain markings or highlighting, as well as stains, bent corners, or any other major defect, but the text is not obscured in any way.

Hardcover. Etat : Good. Connecting readers with great books since 1972! Used textbooks may not include companion materials such as access codes, etc. May have some wear or writing/highlighting. We ship orders daily and Customer Service is our top priority!

Hardcover. Etat : Good. No Jacket. Missing dust jacket; Pages can have notes/highlighting. Spine may show signs of wear. ~ ThriftBooks: Read More, Spend Less.

Hardcover. Etat : Good. No Jacket. Pages can have notes/highlighting. Spine may show signs of wear. ~ ThriftBooks: Read More, Spend Less.

Etat : New. *Price HAS BEEN REDUCED by 10% until Monday, May 18 (sale item)* 167 pp., hardcover, new. - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.

Hardcover. Etat : VERY GOOD. hardcover, no DJ, edited by Orlando Aucielio and Daniel L. Flamm, Academic Press, 1989, ISBN 0120676354, 456 pp. including index, illustrated with drawings, tables and graphs. VERY GOOD (previous owner name and book store price on the front flyleaf, previous owner name on front pastedown and fore-edge). Inner pages are unmarked and clean. The boards have a vinyl cover.

hardcover. Etat : New. In shrink wrap. Looks like an interesting title!

Etat : Gut. Zustand: Gut | Seiten: 576 | Sprache: Englisch | Produktart: Bücher | An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

Etat : New. In.

Etat : New. In.

Taschenbuch. Etat : Neu. Druck auf Anfrage Neuware - Printed after ordering - An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

Buch. Etat : Neu. Druck auf Anfrage Neuware - Printed after ordering - An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

Paperback. Etat : Brand New. 576 pages. 9.25x6.10x1.30 inches. In Stock.

Boletín de estudios de la revista Teorema. 23x15. 176 pp. Enc. editorial. KRK ediciones. Oviedo, 2009. SECCIÓN MONOGRÁFICA:Simposio sobre la filosofía política de Jorge SantayanaDirector invitado: Krzysztof (Chris) Piotr SkowroñskiKrzysztof (Chris) Piotr Skowroñski, ntroducción / Introduction 5Mathew Caleb Flamm, Pragmatic Moralism and the Politicization of Philosophy 17Manuel Garrido, Segundos pensamientos de Santayana y Ortega sobre sociedad y política 55Till Kinzel, The Tragedy and Comedy of Political Life in the Thought of George Santayana 65James Seaton, Santayana on Fascism and English Liberty 81.DOCUMENTOS:George Santayana, Libertad Clásica 101Raimundo Lida, Santayana 107ARTÍCULOS:María Aurelia Di Berardino, Un diálogo en el limbo: Santayana y el pragmatismo sobre la verdad 119.REVISTA DE LIBROS:Daniel Moreno Moreno, Las cartas de un solitario fascinante 131José Miguel Sabater Rillo, Un heterodoxo en Harvard 137Carmen González Marín, Sin esperanza, con convencimiento: deambulando con Jorge Santayana 153Amparo Zacarés Pamblanco, La razón en el arte y otros escritos de estética 159Michael Brodrick, The Essences of Santayana 163.INFORMES Y NOTICIAS:Ángel M. Faerna, Noticia del proyecto de investigación: La filosofía de George Santayana: interpretaciones contemporáneas 169.ISBN: 0210-1602-29.

Etat : new. Questo è un articolo print on demand.

Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Proceedings of the NATO Advanced Study Institute, Alicante, Spain, September 4-16, 1988 An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evoluti.

Gebunden. Etat : New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Proceedings of the NATO Advanced Study Institute, Alicante, Spain, September 4-16, 1988 An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evoluti.

Buch. Etat : Neu. Plasma-Surface Interactions and Processing of Materials | O. Auciello (u. a.) | Buch | xiv | Englisch | 1990 | Springer | EAN 9780792305842 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.

Buch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space.The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials.The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 576 pp. Englisch.

Taschenbuch. Etat : Neu. This item is printed on demand - Print on Demand Titel. Neuware -An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space.The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials.The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 576 pp. Englisch.

Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers. 576 pp. Englisch.

Buch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers. 576 pp. Englisch.