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Synopsis
This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node.
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- ÉditeurLAP LAMBERT Academic Publishing
- Date d'édition2016
- ISBN 10 3659827401
- ISBN 13 9783659827402
- ReliureBroché
- Langueanglais
- Nombre de pages168
- Coordonnées du fabricantnon disponible
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Extreme Ultraviolet Lithography
Edité par
LAP LAMBERT Academic Publishing, 2016
ISBN 10 : 3659827401
ISBN 13 : 9783659827402
Neuf
Couverture souple
Vendeur : moluna, Greven, Allemagne
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Etat : New. N° de réf. du vendeur 151428811
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Extreme Ultraviolet Lithography : Principles and Basic Technologies
Edité par
LAP Lambert Academic Publishing, 2016
ISBN 10 : 3659827401
ISBN 13 : 9783659827402
Neuf
Taschenbuch
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node. N° de réf. du vendeur 9783659827402
Quantité disponible : 1 disponible(s)
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Extreme Ultraviolet Lithography
Edité par
LAP Lambert Academic Publishing Jul 2016, 2016
ISBN 10 : 3659827401
ISBN 13 : 9783659827402
Neuf
Taschenbuch
Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node. 168 pp. Englisch. N° de réf. du vendeur 9783659827402
Quantité disponible : 2 disponible(s)
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Extreme Ultraviolet Lithography
Edité par
LAP Lambert Academic Publishing Jul 2016, 2016
ISBN 10 : 3659827401
ISBN 13 : 9783659827402
Neuf
Taschenbuch
Vendeur : buchversandmimpf2000, Emtmannsberg, BAYE, Allemagne
Évaluation du vendeur 5 sur 5 étoiles
Taschenbuch. Etat : Neu. Neuware -This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirrors; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most promising lithographic technology for device fabrication at the 7-nm node.Books on Demand GmbH, Überseering 33, 22297 Hamburg 168 pp. Englisch. N° de réf. du vendeur 9783659827402
Quantité disponible : 2 disponible(s)
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Extreme Ultraviolet Lithography: Principles and Basic Technologies
Edité par
Lap Lambert Academic Publishing, 2016
ISBN 10 : 3659827401
ISBN 13 : 9783659827402
Neuf
Paperback
Vendeur : Revaluation Books, Exeter, Royaume-Uni
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Paperback. Etat : Brand New. 168 pages. 8.62x5.87x0.43 inches. In Stock. N° de réf. du vendeur 3659827401
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