Vendeur : Chiron Media, Wallingford, Royaume-Uni
EUR 136,74
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Ajouter au panierHardcover. Etat : New.
Vendeur : Majestic Books, Hounslow, Royaume-Uni
EUR 156,56
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Ajouter au panierEtat : New. pp. 634.
Vendeur : GreatBookPrices, Columbia, MD, Etats-Unis
EUR 185,01
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Ajouter au panierEtat : New.
Vendeur : Biblios, Frankfurt am main, HESSE, Allemagne
EUR 184,38
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Ajouter au panierEtat : New. pp. 634.
Vendeur : Ria Christie Collections, Uxbridge, Royaume-Uni
EUR 187,71
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Ajouter au panierEtat : New. In.
Vendeur : GreatBookPricesUK, Woodford Green, Royaume-Uni
EUR 187,70
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Ajouter au panierEtat : New.
Vendeur : GreatBookPrices, Columbia, MD, Etats-Unis
EUR 214,35
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Ajouter au panierEtat : As New. Unread book in perfect condition.
Vendeur : GreatBookPricesUK, Woodford Green, Royaume-Uni
EUR 211,55
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Ajouter au panierEtat : As New. Unread book in perfect condition.
Langue: anglais
Edité par Elsevier Health Sciences, GB, 2016
ISBN 10 : 0081003544 ISBN 13 : 9780081003541
Vendeur : Rarewaves.com USA, London, LONDO, Royaume-Uni
EUR 243,87
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Ajouter au panierHardback. Etat : New. As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.
Langue: anglais
Edité par Elsevier Science & Technology, 2016
ISBN 10 : 0081003544 ISBN 13 : 9780081003541
Vendeur : moluna, Greven, Allemagne
EUR 206,12
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Ajouter au panierGebunden. Etat : New.
Langue: anglais
Edité par Elsevier Health Sciences, GB, 2016
ISBN 10 : 0081003544 ISBN 13 : 9780081003541
Vendeur : Rarewaves.com UK, London, Royaume-Uni
EUR 229,42
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Ajouter au panierHardback. Etat : New. As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.
Langue: anglais
Edité par Elsevier Science & Technology Nov 2016, 2016
ISBN 10 : 0081003544 ISBN 13 : 9780081003541
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
EUR 256,19
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Ajouter au panierBuch. Etat : Neu. Neuware.
Vendeur : Books Puddle, New York, NY, Etats-Unis
EUR 183,83
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Ajouter au panierEtat : New. pp. 634.
Vendeur : Brook Bookstore On Demand, Napoli, NA, Italie
EUR 125,74
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Ajouter au panierEtat : new. Questo è un articolo print on demand.
Vendeur : Revaluation Books, Exeter, Royaume-Uni
EUR 157,46
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Ajouter au panierHardcover. Etat : Brand New. 608 pages. 9.25x7.50x1.50 inches. In Stock. This item is printed on demand.