Vendeur : Basi6 International, Irving, TX, Etats-Unis
EUR 57,47
Quantité disponible : 1 disponible(s)
Ajouter au panierEtat : Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
Langue: anglais
Edité par William Andrew 1991-01-01, 1991
ISBN 10 : 0815512813 ISBN 13 : 9780815512813
Vendeur : Chiron Media, Wallingford, Royaume-Uni
EUR 46,03
Quantité disponible : Plus de 20 disponibles
Ajouter au panierHardcover. Etat : New.
Vendeur : GreatBookPrices, Columbia, MD, Etats-Unis
EUR 62,91
Quantité disponible : Plus de 20 disponibles
Ajouter au panierEtat : New.
Langue: anglais
Edité par William Andrew Publishing, 1991
ISBN 10 : 0815512813 ISBN 13 : 9780815512813
Vendeur : Majestic Books, Hounslow, Royaume-Uni
EUR 57,55
Quantité disponible : 3 disponible(s)
Ajouter au panierEtat : New. pp. 672 Illus.
Vendeur : GreatBookPrices, Columbia, MD, Etats-Unis
EUR 73,98
Quantité disponible : Plus de 20 disponibles
Ajouter au panierEtat : As New. Unread book in perfect condition.
Vendeur : Ria Christie Collections, Uxbridge, Royaume-Uni
EUR 66,24
Quantité disponible : Plus de 20 disponibles
Ajouter au panierEtat : New. In.
Vendeur : GreatBookPricesUK, Woodford Green, Royaume-Uni
EUR 62,99
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Ajouter au panierEtat : New.
Langue: anglais
Edité par Noyes Data Corporation, NJ, 1991
Vendeur : Bob "The Bookman" DePino, ORLANDO, FL, Etats-Unis
Edition originale
EUR 74,66
Quantité disponible : 1 disponible(s)
Ajouter au panierHardcover. Etat : Very Good. Etat de la jaquette : Very Good. First Edition. Edited by William B. Glendinning and John N. Helbert, this 1991 technical volume is a detailed reference work on the science and engineering of microlithography?the core process used to manufacture integrated circuits in microelectronics. The book explains how patterns are transferred onto semiconductor wafers using light, electron beams, and X-ray techniques. It covers both theoretical foundations and practical applications, including photoresist chemistry, optical systems, resolution limits, and process control. Topics such as positive vs. negative resists, thin-film behavior, and defect management are addressed in depth. As part of a broader materials science and process technology series, it compiles contributions from multiple experts, making it a comprehensive snapshot of lithographic technology at the dawn of the modern VLSI (Very Large Scale Integration) era. It is aimed primarily at engineers, researchers, and advanced students working in semiconductor fabrication. THIS "Review Copy" was delivered before the actual publication date of 1/15/1992. Hard cover edition with unclipped dustjacket. 649 pages. Dimensions: 6.25" by 9.5". Published by Noyes Data Corporation, NJ. 1st printing, 1991. B&W illustrations. B&W photographs. Black binding. Dustjacket defect(s): Some tears. Some wrinkling/creasing. 3.25 Pound Media Shipping Rate with Multiple Product Orders. (Min Shipping Rate 1 Pound per Order). Order More and SAVE! Genre(s): Electronics / Technology / Semiconductors / English. (B106).
Langue: anglais
Edité par William Andrew Publishing, 1991
ISBN 10 : 0815512813 ISBN 13 : 9780815512813
Vendeur : Books Puddle, New York, NY, Etats-Unis
EUR 80,12
Quantité disponible : 3 disponible(s)
Ajouter au panierEtat : New. pp. 672.
Langue: anglais
Edité par William Andrew Publishing, 1991
ISBN 10 : 0815512813 ISBN 13 : 9780815512813
Vendeur : Biblios, Frankfurt am main, HESSE, Allemagne
EUR 73,60
Quantité disponible : 3 disponible(s)
Ajouter au panierEtat : New. pp. 672.
Vendeur : GreatBookPricesUK, Woodford Green, Royaume-Uni
EUR 72,87
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Ajouter au panierEtat : As New. Unread book in perfect condition.
EUR 91,72
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Ajouter au panierEtat : New. Redaktion: William B. GlendinningJohn Helbert is a Senior Member of the Motorola Technical Staff. He earned his doctorate in PhysicalThis handbook gives readers a close look at the entire technology of printing very high resolution and high den.
EUR 188,73
Quantité disponible : 1 disponible(s)
Ajouter au panierEtat : Gut. Zustand: Gut | Seiten: 1022 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.
Vendeur : Mispah books, Redhill, SURRE, Royaume-Uni
EUR 292,90
Quantité disponible : 1 disponible(s)
Ajouter au panierHardcover. Etat : Like New. Like New. book.
Vendeur : Brook Bookstore On Demand, Napoli, NA, Italie
EUR 53,13
Quantité disponible : Plus de 20 disponibles
Ajouter au panierEtat : new. Questo è un articolo print on demand.
Vendeur : Revaluation Books, Exeter, Royaume-Uni
EUR 53,31
Quantité disponible : 2 disponible(s)
Ajouter au panierHardcover. Etat : Brand New. 1st edition. 671 pages. 10.00x6.75x2.25 inches. In Stock. This item is printed on demand.
Vendeur : BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Allemagne
EUR 54,95
Quantité disponible : 2 disponible(s)
Ajouter au panierBuch. Etat : Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook. 672 pp. Englisch.
Vendeur : AHA-BUCH GmbH, Einbeck, Allemagne
EUR 66,28
Quantité disponible : 2 disponible(s)
Ajouter au panierBuch. Etat : Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.